Spin Reorientation Transition in Ni Films on Cu(100)

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dc.contributor.author Mankey, Gary
dc.date.accessioned 2019-07-16T19:12:29Z
dc.date.available 2019-07-16T19:12:29Z
dc.date.issued 1998-06-04
dc.identifier.citation Wu, S., Mankey, G., Huang, F., Willis, R. (1994): Spin Reorientation Transition in Ni Films on Cu(100). Journal of Applied Physics, 76(10). DOI: https://doi.org/10.1063/1.358240 en_US
dc.identifier.uri http://ir.ua.edu/handle/123456789/5976
dc.description.abstract The magnetic anisotropy of Ni films grown on single‐crystal Cu(100) was studied in situ using the surface magneto‐optic Kerr effect. The easy axis of magnetization lies in the plane of the film for ultrathin films and it is perpendicular to the film above a switching thickness. This behavior is attributed to a specific contribution to the magnetocrystalline anisotropy energy induced by a change in the film microstructure above a critical thickness. In the Ni/Cu(100) system, the magnetoelastic interface anisotropy favors perpendicular magnetization which becomes comparable to the shape anisotropy at the switching thickness. We compare the switching thickness and magnetization of films grown using different processing conditions. en_US
dc.format.mimetype application/pdf en_US
dc.language English en_US
dc.subject Thin films en_US
dc.subject Magnetooptical effects en_US
dc.subject Magnetic anisotropy en_US
dc.subject Thermodynamic states and processes en_US
dc.title Spin Reorientation Transition in Ni Films on Cu(100) en_US
dc.type text en_US


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