Strong Uniaxial Magnetic Anisotropy in CoFe films on Obliquely Sputtered Ru Underlayer

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dc.contributor.author Mankey, Gary
dc.date.accessioned 2019-07-10T20:35:19Z
dc.date.available 2019-07-10T20:35:19Z
dc.date.issued 2009-10-02 en_US
dc.identifier.citation Fukuma, Y., et al. (2009): Strong Uniaxial Magnetic Anisotropy in CoFe films on Obliquely Sputtered Ru Underlayer. Journal of Applied Physics, 106(7).DOI: https://doi.org/10.1063/1.3223538 en_US
dc.identifier.uri http://ir.ua.edu/handle/123456789/5933
dc.description.abstract Co₉₀Fe₁₀ films with an in-plane uniaxial magnetic anisotropy have been grown on an obliquely sputtered thin Ru underlayer. The anisotropy field can be increased up to 200 Oe. The hysteresis curves show a very high squareness in the easy axis direction and almost no hysteresis in the hard axis direction, suggesting that the induced uniaxial anisotropy is uniform throughout the films. The switching characteristics of the nanoelements fabricated from the films by e-beam lithography are also investigated. There is no degradation of the magnetic anisotropy after the annealing and lithographical process. We thank Y. Otani and T. Kimura for the help with the MOKE measurements. This work was supported in part by the National Science Foundation MRSEC Grant No. DMR-0213985. Y.F. is supported by JSPS Postdoctoral Fellowships for Research Abroad. en_US
dc.format.mimetype application/pdf en_US
dc.language English en_US
dc.subject E-beam lithography en_US
dc.subject Machining en_US
dc.subject Magnetic devices en_US
dc.subject Magnetic ordering en_US
dc.subject Magnetic materials en_US
dc.subject Thin films en_US
dc.subject Chemical elements en_US
dc.subject Magnetic anisotropy en_US
dc.subject Electrical properties and parameters en_US
dc.subject Thermodynamic states and processes en_US
dc.title Strong Uniaxial Magnetic Anisotropy in CoFe films on Obliquely Sputtered Ru Underlayer en_US
dc.type text en_US


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