Lattice Expansion in Nanocrystalline Niobium Thin Films
| dc.contributor.author | Banerjee, R. | |
| dc.contributor.author | Sperling, E. A. | |
| dc.contributor.author | Thompson, G. B. | |
| dc.contributor.author | Fraser, H. L. | |
| dc.contributor.author | Bose, S. | |
| dc.contributor.author | Ayyub, P. | |
| dc.contributor.other | University of Alabama Tuscaloosa | |
| dc.date.accessioned | 2018-11-13T14:56:24Z | |
| dc.date.available | 2018-11-13T14:56:24Z | |
| dc.date.issued | 2003-04-09 | |
| dc.description.abstract | High-purity nanocrystalline niobium (Nb) thin films have been deposited using high-pressure magnetron sputter deposition. Increasing the pressure of the sputtering gas during deposition has systematically led to reduced crystallite sizes in these films. Based on x-ray and electron diffraction results, it is observed that the nanocrystalline Nb films exhibit a significantly large lattice expansion with reduction in crystallite size. There is however, no change in the bcc crystal structure on reduction in crystallite size to below 5 nm. The lattice expansion in nanocrystalline Nb has been simulated by employing a recently proposed model based on linear elasticity and by appropriately modifying it to incorporate a crystallite-size-dependent width of the grain boundary. | en_US |
| dc.format.mimetype | application/pdf | |
| dc.identifier.citation | Banerjee, R., et al. (2003): Lattice Expansion in Nanocrystalline Niobium Thin Films. Applied Physics Letters, 82(24). | |
| dc.identifier.uri | http://ir.ua.edu/handle/123456789/4914 | |
| dc.subject | Nanomaterials | |
| dc.subject | Sputter deposition | |
| dc.subject | Radiowave and microwave technology | |
| dc.subject | Electron diffraction | |
| dc.subject | Transition metals | |
| dc.subject | Thin films | |
| dc.subject | Crystallographic defects | |
| dc.subject | Linear elasticity | |
| dc.title | Lattice Expansion in Nanocrystalline Niobium Thin Films | en_US |
| dc.type | text |
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