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Lattice Expansion in Nanocrystalline Niobium Thin Films

dc.contributor.authorBanerjee, R.
dc.contributor.authorSperling, E. A.
dc.contributor.authorThompson, G. B.
dc.contributor.authorFraser, H. L.
dc.contributor.authorBose, S.
dc.contributor.authorAyyub, P.
dc.contributor.otherUniversity of Alabama Tuscaloosa
dc.date.accessioned2018-11-13T14:56:24Z
dc.date.available2018-11-13T14:56:24Z
dc.date.issued2003-04-09
dc.description.abstractHigh-purity nanocrystalline niobium (Nb) thin films have been deposited using high-pressure magnetron sputter deposition. Increasing the pressure of the sputtering gas during deposition has systematically led to reduced crystallite sizes in these films. Based on x-ray and electron diffraction results, it is observed that the nanocrystalline Nb films exhibit a significantly large lattice expansion with reduction in crystallite size. There is however, no change in the bcc crystal structure on reduction in crystallite size to below 5 nm. The lattice expansion in nanocrystalline Nb has been simulated by employing a recently proposed model based on linear elasticity and by appropriately modifying it to incorporate a crystallite-size-dependent width of the grain boundary.en_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationBanerjee, R., et al. (2003): Lattice Expansion in Nanocrystalline Niobium Thin Films. Applied Physics Letters, 82(24).
dc.identifier.urihttp://ir.ua.edu/handle/123456789/4914
dc.subjectNanomaterials
dc.subjectSputter deposition
dc.subjectRadiowave and microwave technology
dc.subjectElectron diffraction
dc.subjectTransition metals
dc.subjectThin films
dc.subjectCrystallographic defects
dc.subjectLinear elasticity
dc.titleLattice Expansion in Nanocrystalline Niobium Thin Filmsen_US
dc.typetext

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