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Microstructural and Ferromagnetic Resonance Properties of Epitaxial Nickel Ferrite Films Grown by Chemical Vapor Deposition

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dc.contributor.authorLi, N.
dc.contributor.authorSchafer, S.
dc.contributor.authorDatta, R.
dc.contributor.authorMewes, T.
dc.contributor.authorKlein, M.
dc.contributor.authorGupta, A.
dc.contributor.otherUniversity of Alabama Tuscaloosa
dc.date.accessioned2018-08-31T16:01:54Z
dc.date.available2018-08-31T16:01:54Z
dc.date.issued2012
dc.description.abstractMicrostructural and ferromagnetic resonance properties of epitaxial nickel ferrite (NiFe2O4) films grown by direct liquid injection chemical vapor deposition are reported. While high-quality epitaxial growth of NiFe2O4 films on (100)-oriented MgAl2O4 substrate is confirmed by high resolution transmission electron microscopy, bright field (diffraction contrast) TEM studies reveal the presence of dislocations and also dark diffused contrast areas, which originate from antiphase domains. Angle and frequency-dependent ferromagnetic resonance (FMR) experiments are conducted to determine the magnetic anisotropy and the magnetic relaxation. A low out-of-plane FMR linewidth of 160 Oe has been observed at a frequency of 10 GHz.en_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationLi, N., Schafer, S., Datta, R., Mewes, T., Klein, M., Gupta, A. (2012): Microstructural and Ferromagnetic Resonance Properties of Epitaxial Nickel Ferrite Films Grown by Chemical Vapor Deposition, Applied Physics Letters, 101(13).
dc.identifier.urihttp://ir.ua.edu/handle/123456789/3807
dc.subjectLaminar flow stability
dc.subjectInverse scattering
dc.subjectSlurries
dc.subjectLow energy electron microscopy
dc.subjectElectroacoustic transducers
dc.subjectMetamaterials
dc.subjectSlip boundary effects
dc.subjectElectrostatic sound recording
dc.subjectSkin
dc.subjectCathode ray tube devices
dc.titleMicrostructural and Ferromagnetic Resonance Properties of Epitaxial Nickel Ferrite Films Grown by Chemical Vapor Depositionen_US
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