Interrelationship of in Situ Growth Stress Evolution and Phase Transformations in Ti/W Multilayered Thin Films

dc.contributor.authorThompson, Gregory B.
dc.contributor.authorWan, Li
dc.contributor.authorYu, Xiao-Xiang
dc.contributor.authorZhou, Xuyang
dc.contributor.otherUniversity of Alabama Tuscaloosa
dc.date.accessioned2018-11-12T21:36:14Z
dc.date.available2018-11-12T21:36:14Z
dc.date.issued2016-06-24
dc.description.abstractThis paper addresses the in situ growth stress evolution and phase transformation of bcc to hcp Ti in Ti/W multilayered thin films. A series of equal layer thicknesses from 20 nm to 1 nm were deposited. As the bilayer thickness reduced, the overall film stress became less compressive until the Ti transformed from hcp (at the larger layer thicknesses) to bcc in the 1 nm/1 nm multilayer. The pseudomorphic bcc stabilization resulted in a recovery of the compressive stress to values near that for the bulk phase stabilized for the 5 nm/5 nm multilayer. A discernable change in stress slope was noted for the bcc to hcp Ti transition as a function of Ti layer thickness. The stress states for each film, during film growth, are rationalized by the lattice matching of the phase with the growth surface. These results are coupled to a molecular dynamics deposition simulation which revealed good agreement with the experimentally observed transformation thickness.en_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationLi Wan, et al. (2016): Interrelationship of in Situ Growth Stress Evolution and Phase Transformations in Ti/W Multilayered Thin Films. Applied Physics Letters, 119(24).
dc.identifier.urihttp://ir.ua.edu/handle/123456789/4868
dc.subjectCompressive stress
dc.subjectTransmission electron microscopy
dc.subjectMicroscopy
dc.subjectStress measurement
dc.subjectPhase identification
dc.subjectThin films
dc.subjectMolecular dynamics
dc.subjectCrystal structure
dc.subjectPhase transitions
dc.subjectCrystallographic defects
dc.titleInterrelationship of in Situ Growth Stress Evolution and Phase Transformations in Ti/W Multilayered Thin Filmsen_US
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