EFFECT OF SUBSTRATE SYMMETRY ON THE PREFERRED MAGNETIZATION ORIENTATION OF NI FILMS ON CU

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dc.contributor.authorWu, SZ
dc.contributor.authorMankey, GJ
dc.contributor.authorWillis, RF
dc.contributor.otherPennsylvania Commonwealth System of Higher Education (PCSHE)
dc.contributor.otherPennsylvania State University
dc.contributor.otherPennsylvania State University - University Park
dc.contributor.otherUnited States Department of Energy (DOE)
dc.contributor.otherLawrence Berkeley National Laboratory
dc.contributor.otherUniversity of Alabama Tuscaloosa
dc.date.accessioned2019-07-22T19:40:18Z
dc.date.available2019-07-22T19:40:18Z
dc.date.issued1998-06-04
dc.description.abstractFor ultrathin Ni films grown on Cu(100) and Cu(110), the easy axis of magnetization starts out in the plane of the films. Above a critical thickness, the preferred magnetization orientation changes to perpendicular to the films. This behavior is contrary to the spin reorientation transition reported for many thin film ferromagnetic systems where the preferred magnetization orientation starts out perpendicular to the film and then switches to in-plane above a critical thickness. We report in situ surface magneto-optic Kerr effect measurements of the magnetic anisotropy as a function of film thickness. The change in the predominant domain orientation distribution occurs at 8 monolayers (MLs) for Ni on Cu(100) and at 16 ML for Ni on Cu(110). For Ni on Cu(lll) no such change is observed down to 3 ML thickness. These results are discussed in terms of competing surface anisotropy and dipole-dipole energy terms. © 1995, American Vacuum Society. All rights reserved.en_US
dc.format.mimetypeapplication/pdf
dc.identifier.citationWu, S., Mankey, G., Willis, R. (1995): Effect of Substrate Symmetry on the Preferred Magnetization Orientation of Ni Films on Cu. Journal of Vacuum Science and Technology A, 13(3). DOI: https://doi.org/10.1116/1.579694
dc.identifier.doi10.1116/1.579694
dc.identifier.orcidhttps://orcid.org/0000-0003-3163-5159
dc.identifier.orcidhttps://orcid.org/0000-0003-3163-5159
dc.identifier.urihttp://ir.ua.edu/handle/123456789/6011
dc.languageEnglish
dc.language.isoen_US
dc.publisherAmerican Institute of Physics
dc.subjectULTRATHIN FE FILMS
dc.subjectMAGNETOCRYSTALLINE ANISOTROPY
dc.subjectSPIN ANISOTROPY
dc.subjectTRANSITION
dc.subjectMOMENT
dc.subjectMaterials Science, Coatings & Films
dc.subjectPhysics, Applied
dc.subjectMaterials Science
dc.subjectPhysics
dc.titleEFFECT OF SUBSTRATE SYMMETRY ON THE PREFERRED MAGNETIZATION ORIENTATION OF NI FILMS ON CUen_US
dc.typetext
dc.typeArticle

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