Ambient-pressure CVD of graphene on low-index Ni surfaces using methane: A combined experimental and first-principles study
dc.contributor.author | Mafra, Daniela L. | |
dc.contributor.author | Olmos-Asar, Jimena A. | |
dc.contributor.author | Negreiros, Fabio R. | |
dc.contributor.author | Reina, Alfonso | |
dc.contributor.author | Kim, Ki Kang | |
dc.contributor.author | Dresselhaus, Mildred S. | |
dc.contributor.author | Kong, Jing | |
dc.contributor.author | Mankey, Gary J. | |
dc.contributor.author | Araujo, Paulo T. | |
dc.contributor.other | Massachusetts Institute of Technology (MIT) | |
dc.contributor.other | Universidade Federal do ABC (UFABC) | |
dc.contributor.other | Consejo Nacional de Investigaciones Cientificas y Tecnicas (CONICET) | |
dc.contributor.other | National University of Cordoba | |
dc.contributor.other | Dongguk University | |
dc.contributor.other | University of Alabama Tuscaloosa | |
dc.contributor.other | Universidade Federal do Para | |
dc.date.accessioned | 2019-07-18T20:13:22Z | |
dc.date.available | 2019-07-18T20:13:22Z | |
dc.date.issued | 2018-07-23 | |
dc.description.abstract | The growth of large area single-layer graphene (1-LG) is studied using ambient pressure chemical vapor deposition on single-crystal Ni(111), Ni(110), and Ni(100). By varying both the furnace temperature in the range of 800-1100 degrees C and the gas flow through the growth chamber, uniform, high-quality 1-LG is obtained for Ni(111) and Ni(110) single crystals and for Ni(100) thin films. Surprisingly, only multilayer graphene growth could be obtained for single-crystal Ni(100). The experimental results are analyzed to determine the optimum combination of temperature and gas flow. Characterization with optical microscopy, Raman spectroscopy, and optical transmission support our findings. Density-functional theory calculations are performed to determine the energy barriers for diffusion, segregation, and adsorption, and model the kinetic pathways for formation of different carbon structures on the low-index surfaces of Ni. | en_US |
dc.format.mimetype | application/pdf | |
dc.identifier.citation | Mafra, D., et al. (2018): Ambient-pressure CVD of Graphene on Low-index Ni Surfaces using Methane: A Combined Experimental and First-Principles Study. Physical Review Materials, 2(7). DOI: https://doi.org/10.1103/PhysRevMaterials.2.073404 | |
dc.identifier.doi | 10.1103/PhysRevMaterials.2.073404 | |
dc.identifier.orcid | https://orcid.org/0000-0003-3163-5159 | |
dc.identifier.orcid | https://orcid.org/0000-0002-4380-9702 | |
dc.identifier.uri | http://ir.ua.edu/handle/123456789/5995 | |
dc.language | English | |
dc.language.iso | en_US | |
dc.publisher | American Physical Society | |
dc.subject | FEW-LAYER GRAPHENE | |
dc.subject | LARGE-AREA | |
dc.subject | HIGH-QUALITY | |
dc.subject | CARBON | |
dc.subject | NICKEL | |
dc.subject | SEGREGATION | |
dc.subject | GROWTH | |
dc.subject | NI(111) | |
dc.subject | FILMS | |
dc.subject | ADSORPTION | |
dc.subject | Materials Science, Multidisciplinary | |
dc.subject | Materials Science | |
dc.title | Ambient-pressure CVD of graphene on low-index Ni surfaces using methane: A combined experimental and first-principles study | en_US |
dc.type | text | |
dc.type | Article |
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