Evaluation of fluid dynamic effect on thin film growth in a horizontal type meso-scale chemical vapor deposition reactor using computational fluid dynamics

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dc.contributorBaker, John
dc.contributorBao, Yuping
dc.contributorCarlson, Eric S.
dc.contributor.advisorKlein, Tonya M.
dc.contributor.authorTabatabaei Sadeghi, Sahar
dc.contributor.otherUniversity of Alabama Tuscaloosa
dc.date.accessioned2017-03-01T16:47:41Z
dc.date.available2017-03-01T16:47:41Z
dc.date.issued2013
dc.descriptionElectronic Thesis or Dissertationen_US
dc.description.abstractTo design and analyze chemical vapor deposition (CVD) reactors, computer models are regularly utilized. The foremost aim of this thesis research is to understand how thin film uniformity can be controlled in a CVD reactor. A complete understanding of chemical reactions that take place both in gas phase and at the deposition surface is required to predict thin film properties such as growth rate and composition precisely, however, deposition rates and surface topography can be determined by the arrival flux of reactants in a mass-transfer limited regime. In order to understand experimental thickness and roughness uniformity, a predictive model has been developed to study the fluid dynamic effect on thin film growth in a horizontal type reactor using velocity, temperature, pressure and viscosity as tunable parameters upon which velocity profiles within a CVD reactor have been evaluated using computational fluid dynamic (CFD) calculations. Through this predictive model, it is shown that fluid velocity is the major variable contributing to transverse roll cell formation compared to temperature and pressure gradients present during thin film deposition in a meso-scale CVD reactor. These results provide a physical insight regarding improved reactor operation conditions that influence uniformity.en_US
dc.format.extent103 p.
dc.format.mediumelectronic
dc.format.mimetypeapplication/pdf
dc.identifier.otheru0015_0000001_0001253
dc.identifier.otherTabatabaeiSadeghi_alatus_0004M_11531
dc.identifier.urihttps://ir.ua.edu/handle/123456789/1723
dc.languageEnglish
dc.language.isoen_US
dc.publisherUniversity of Alabama Libraries
dc.relation.hasversionborn digital
dc.relation.ispartofThe University of Alabama Electronic Theses and Dissertations
dc.relation.ispartofThe University of Alabama Libraries Digital Collections
dc.rightsAll rights reserved by the author unless otherwise indicated.en_US
dc.subjectEngineering
dc.titleEvaluation of fluid dynamic effect on thin film growth in a horizontal type meso-scale chemical vapor deposition reactor using computational fluid dynamicsen_US
dc.typethesis
dc.typetext
etdms.degree.departmentUniversity of Alabama. Department of Chemical and Biological Engineering
etdms.degree.disciplineChemical & Biological Engineering
etdms.degree.grantorThe University of Alabama
etdms.degree.levelmaster's
etdms.degree.nameM.S.

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