The Effect of Microstructure on the Magnetic Behavior of Epitaxial Cobalt Layers

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dc.contributor.author Mankey, Gary
dc.date.accessioned 2019-07-23T16:11:28Z
dc.date.available 2019-07-23T16:11:28Z
dc.date.copyright 1991
dc.identifier.citation Mankey, G., et al. (1991): The Effect of Microstructure on the Magnetic Behavior of Epitaxial Cobalt Layers. Journal of Vacuum Science and Technology A, 9(3). DOI: https://doi.org/10.1116/1.577666 en_US
dc.identifier.issn 0734-2101
dc.identifier.uri http://ir.ua.edu/handle/123456789/6022
dc.description.abstract We have studied the magnetic behavior of thin cobalt films epitaxed on a Cu (001) substrate as a function of their growth temperature. At 150 K, the film texture is rough and the surface coverage is incomplete for film thicknesses <1.2 monolayers. Smoother films are obtained as the substrate temperature is increased, but at the expense of increased copper interdiffusion. Growth of films at 450 K produces smooth continuous epitaxial layers but coated with a layer of interdiffused copper which serves to lower the surface free energy. Copper interdiffusion can be controlled at intermediate temperatures between 300 and 450 K. We report on the effect of annealing cycles on the microstructure of these films in relation to their magnetic properties, as revealed by surface magneto‐optic Kerr effect hysteresis loop behavior. en_US
dc.format.mimetype applications/pdf en_US
dc.language English en_US
dc.publisher American Vacuum Society en_US
dc.subject Thin films en_US
dc.subject Epitaxy en_US
dc.subject Surface energy en_US
dc.subject Magnetic materials en_US
dc.title The Effect of Microstructure on the Magnetic Behavior of Epitaxial Cobalt Layers en_US
dc.type text en_US
dc.rights.holder American Vacuum Society en_US


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