Abstract:
For high frequency device applications, a systematic study of the soft magnetic properties
and magnetization dynamics of (FeCo)-Al alloy thin films has been carried
out. A low effective damping parameter αeff of 0.002 and a high saturation magnetization
of about 1,800 emu/cc are obtained at y=0.2∼0.3 for (Fe1-yCoy)98Al2
alloy thin films deposited onto fused silica and MgO(100) at an ambient temperature
during deposition. Those films are of the bcc structure with the <110>
orientation normal to the film plane. They possess a columnar structure, grown
along the film normal. The column width is found to be about 20 nm for
y=0.25. It is concluded that the (FeCo)-Al thin films with a damping parameter
as low as 0.002 and high saturation magnetization of about 1,800 emu/cc have
been successfully fabricated, and that they are potential for future high frequency
device applications.