Evaluation of fluid dynamic effect on thin film growth in a horizontal type meso-scale chemical vapor deposition reactor using computational fluid dynamics

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dc.contributor Baker, John
dc.contributor Bao, Yuping
dc.contributor Carlson, Eric S.
dc.contributor.advisor Klein, Tonya M.
dc.contributor.author Tabatabaei Sadeghi, Sahar
dc.date.accessioned 2017-03-01T16:47:41Z
dc.date.available 2017-03-01T16:47:41Z
dc.date.issued 2013
dc.identifier.other u0015_0000001_0001253
dc.identifier.other TabatabaeiSadeghi_alatus_0004M_11531
dc.identifier.uri https://ir.ua.edu/handle/123456789/1723
dc.description Electronic Thesis or Dissertation
dc.description.abstract To design and analyze chemical vapor deposition (CVD) reactors, computer models are regularly utilized. The foremost aim of this thesis research is to understand how thin film uniformity can be controlled in a CVD reactor. A complete understanding of chemical reactions that take place both in gas phase and at the deposition surface is required to predict thin film properties such as growth rate and composition precisely, however, deposition rates and surface topography can be determined by the arrival flux of reactants in a mass-transfer limited regime. In order to understand experimental thickness and roughness uniformity, a predictive model has been developed to study the fluid dynamic effect on thin film growth in a horizontal type reactor using velocity, temperature, pressure and viscosity as tunable parameters upon which velocity profiles within a CVD reactor have been evaluated using computational fluid dynamic (CFD) calculations. Through this predictive model, it is shown that fluid velocity is the major variable contributing to transverse roll cell formation compared to temperature and pressure gradients present during thin film deposition in a meso-scale CVD reactor. These results provide a physical insight regarding improved reactor operation conditions that influence uniformity.
dc.format.extent 103 p.
dc.format.medium electronic
dc.format.mimetype application/pdf
dc.language English
dc.language.iso en_US
dc.publisher University of Alabama Libraries
dc.relation.ispartof The University of Alabama Electronic Theses and Dissertations
dc.relation.ispartof The University of Alabama Libraries Digital Collections
dc.relation.hasversion born digital
dc.rights All rights reserved by the author unless otherwise indicated.
dc.subject.other Engineering
dc.title Evaluation of fluid dynamic effect on thin film growth in a horizontal type meso-scale chemical vapor deposition reactor using computational fluid dynamics
dc.type thesis
dc.type text
etdms.degree.department University of Alabama. Dept. of Chemical and Biological Engineering
etdms.degree.discipline Chemical & Biological Engineering
etdms.degree.grantor The University of Alabama
etdms.degree.level master's
etdms.degree.name M.S.


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