Half-metallic CrO_2 thin films for spintronic applications

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dc.contributor LeClair, Patrick R.
dc.contributor Gupta, Arunava
dc.contributor Mankey, Gary J.
dc.contributor Butler, W. H.
dc.contributor White, Raymond E.
dc.contributor.advisor LeClair, Patrick R.
dc.contributor.author Pathak, Manjit
dc.date.accessioned 2017-03-01T14:40:02Z
dc.date.available 2017-03-01T14:40:02Z
dc.date.issued 2011
dc.identifier.other u0015_0000001_0000575
dc.identifier.other Pathak_alatus_0004D_10618
dc.identifier.uri https://ir.ua.edu/handle/123456789/1080
dc.description Electronic Thesis or Dissertation
dc.description.abstract CrO_2 is a well-established half-metallic oxide with near perfect spin polarization - known to have the highest spin polarization among all known materials theoretically as well as experimentally. This means that the conduction electrons in CrO_2 have only one kind of spin i.e. conduction is due only to the majority spin electrons. Because of its high spin polarization, CrO_2 stands as an ideal and one of the most attractive candidates for spin-electronic applications as well as of fundamental interests. The enormous potential of CrO_2 is still untapped since thin film growth modes, interface/surface properties and various factors affecting them are not very well understood or, relatively unknown. Reported works confirm strained growth of (100) CrO_2 films and strain free growth of (110) CrO_2 films on iso-structural TiO_2 substrates investigated using X$ - $ray diffraction. Superconducting quantum interference device (SQUID) and element specific X-ray magnetic circular dichroism (XMCD) techniques were employed to investigate the effect of this substrate-induced strain on the magnetic properties of the films. Magnetic tunnel junctions (MTJ) were fabricated with CrO_2 , Cr_2 O_3 [natural oxide of Cr] as the thin insulating barrier and Co as the other ferromagnetic electrode using photolithography. I-V characteristics of this spin-electronic device are reported. Also, results on the low pressure chemical vapor deposition (CVD) growth of CrO_2 and its comparison with standard growth technique under atmospheric pressure are reported.
dc.format.extent 112 p.
dc.format.medium electronic
dc.format.mimetype application/pdf
dc.language English
dc.language.iso en_US
dc.publisher University of Alabama Libraries
dc.relation.ispartof The University of Alabama Electronic Theses and Dissertations
dc.relation.ispartof The University of Alabama Libraries Digital Collections
dc.relation.hasversion born digital
dc.rights All rights reserved by the author unless otherwise indicated.
dc.subject.other Condensed Matter Physics
dc.subject.other Materials Science
dc.title Half-metallic CrO_2 thin films for spintronic applications
dc.type thesis
dc.type text
etdms.degree.department University of Alabama. Dept. of Physics and Astronomy
etdms.degree.discipline Physics
etdms.degree.grantor The University of Alabama
etdms.degree.level doctoral
etdms.degree.name Ph.D.

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